The new foundry line, which will focus on EUV-based 5 nanometer (nm) and below process technology, has just commenced construction this month and is expected to be in full operation in the second half of 2021. It will play a pivotal role as Samsung aims to expand the use of state-of-the-art process technologies across a myriad of current and next generation applications, including 5G, high-performance computing (HPC) and artificial intelligence (AI).

“This new production facility will expand Samsung’s manufacturing capabilities for sub-5nm process and enable us to rapidly respond to the increasing demand for EUV-based solutions,” said Dr. ES Jung, President and Head of Foundry Business at Samsung Electronics. “We remain committed to addressing the needs of our customers through active investments and recruitment of talents. This will enable us to continue to break new ground while driving robust growth for Samsung’s foundry business.”

Following the initial mass production of the EUV-based 7nm process in early 2019, Samsung recently added a new EUV-dedicated V1 line in Hwaseong, Korea, to its global foundry network. With the new Pyeongtaek facility starting full operation in 2021, Samsung’s foundry capacity based on EUV is expected to increase significantly.

Samsung is scheduled to start mass production of 5nm EUV process in the Hwaseong fab in the second half of this year.

With the addition of the Pyeongtaek fab, Samsung will have a total of seven foundry production lines located in South Korea and the United States, comprised of six 12-inch lines and one 8-inch line.

Here, we explore exactly what EUV is and why it is so integral to developing next-generation chips.

What is EUV?

In the semiconductor industry, EUV refers to extreme ultraviolet lithography, a technology that is expected to bring a radical progress to one of the most important steps in semiconductor manufacturing, photolithography.

When producing semiconductor chips, silicon-based round disks, called “wafers” are coated with a light-sensitive substance and enter a system called a “scanner.” Inside the scanner, a laser light source is cast onto the wafers to create patterns of circuitries, which later are used for forming billions of ultrafine, microscopically small structures, inside a semiconductor chip. This process, while described very concisely, is known as photolithography.

Photo of a tall, box-shaped EUV scanner (courtesy of ASML)

With EUV technology, an EUV system, or EUV scanner, will now be able to perform the photolithography step by utilizing a light source with an “extreme ultraviolet” wavelength. In the world of chip manufacturing, realizing finer circuits is a must, as it enables integration of a greater number of components inside a chip and therefore building faster and more energy efficient chip.

The utilization of an EUV light source will allow for defining finer and denser patterns than previous methods because of its shorter wavelength, which is essential since light isn’t able to directly define features smaller than its own wavelength. Upcoming EUV scanners will, specifically, utilize EUV radiation at a 13.5-nanometer wavelength, less than 1/10th of what current ArF excimer laser scanners are able to provide.

How will EUV be implemented?

Today, semiconductor chips are being used in almost every electronic device imaginable, and EUV technology will be utilized to produce the most advanced semiconductors for mobile, server, network and supercomputing applications.

For its part, Samsung plans to utilize EUV starting with its 7-nanometer LPP (Low Power Plus) process, a cutting-edge technology that the company expects to apply by the second half of 2018. Samsung’s new fabrication line in Hwaseong, which will be ready for production in 2020, will also be set up with EUV technology to provide leading-edge semiconductor products to global market.